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Buhler Inc., Business Area Leybold OpticsRequest Info
 
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Sputtering System
CARY, N.C., Aug. 5, 2009 – Leybold Optics USA Inc. has expanded its line of Helios sputtering tools for optical coatings with the launch of a tool that features 12 substrate stations that measure 8 in. each. The company says that the new item produces higher throughput than the standard 4-in. model.

Leybold.jpgThe new offering features up to three dual-magnetron sputtering sources working at mid-frequency and operating from metal or sub-oxide targets in a reactive mode, resulting in a high deposition rate. An additional oxygen plasma source is used to achieve fully stoichiometric thin-film layers for high density and low loss.

The substrates are placed on a turntable that rotates at 240 rpm. They are handled by an automatic single-substrate load-lock system, keeping the deposition chamber under vacuum. The chamber has to be opened only once a week for cleaning and exchange of targets. Measurement is done directly on the substrate, in transmission or reflection.

The in situ optical monitoring system operates from the UV to the IR and produces repeatable coatings that are shift-free. The stability of the sputtering process allows a quick turnaround time from design to production. Applications include production of polarizers, beamsplitters, and notch and fluorescent filters.

For more information, visit: www.leyboldoptics.com  

Leybold Optics USA Inc.
539 James Jackson Ave.
Cary, NC 27513
Phone: (919) 657 7100
Fax: (919) 657-7101


Published: August 2009
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12 substrate stations8-in.beamsplittersCoatingsdual-magnetronFiltersfluorescent filtersHELIOSLeybold Opticsload-lock systemmetal targetsnotch filtersoptical monitoring systemOpticsoxygen plasma sourcephotonicspolarizersProductsreactive moderepeatable optical coatingsshift-freesputtering toolsub-oxide targets

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