Iris, a macro wafer defect inspection system launched by SemiProbe, is for use by microelectronic device manufacturers. It detects contamination, processes damage and flaws in the circuit pattern, and is suitable for use with microelectromechanical systems, optical components, double-sided devices and photovoltaics. It detects visual defects as small as 3 µm, including probe marks, ink dots, residual films, through silicon vias, bumps, incomplete etches, scratches, cracks and chips, passivation and large-scale contamination. When a defect is identified, its failure code is noted on the wafer map, and the mapping tool enables graphical and data analysis of the inspection during and after the scan. The system is available with manual visual inspection on a semiautomatic stage or with automated inspection using the proprietary Pilot pattern recognition system.