Jenoptik Laser, Optik, Systeme GmbH has released the JenLas disk IR50 for metal and emitter wrap-through applications. The laser combines beam quality in the infrared wavelength range at 1030 nm, with a flexible tunable pulse length. The 45-W system is suitable for laser drilling of silicon wafers for back-contact solar cells. It features passively cooled diodes, laser parameter adjustability and fast acousto-optic modulator power control. It delivers output power of >45 W at 30 kHz, linear polarization and a beam quality of M2 ≤1.2. Other applications include 3-D prototyping, engraving, wafer dicing and scribing, microdrilling, microcutting and microstructuring.