Mirrors for Ultrafast Lasers
Nov 2010Research Electro-Optics Inc. (REO)Request Info
BOULDER, Colo., Nov. 18, 2010 — REO has introduced a series of broadband mirrors that support operation in Ti:sapphire ultrafast lasers.
They offer high reflectivity of >99.7% from 650 to 1100 nm, as well as minimal group velocity dispersion (GVD) and third-order dispersion (TOD), enabling near transform-limited pulse performance over the entire Ti:sapphire tuning range. Coatings for the optics are fabricated using ion beam sputtering. This technology delivers the refractive index and layer thickness precision necessary to reliably meet performance and GVD/TOD specifications, and also produces a fully densified film with good long term environmental stability.
These high reflectors can be designed for operation anywhere in the 0 to 45° angle of incidence range and are typically supplied on fused silica substrates over the 0.25- to 3-in.-diameter range. Nominal surface flatness is λ/10 at 632.8 nm, and surface quality is 10-5. The company can customize the center wavelength, bandwidth and dispersion characteristics of the coatings, and can fabricate the mirrors on a broad range of custom substrate materials and in various sizes.
The high-performance broadband optics are key to enabling the next generation of widely tunable ultrafast laser oscillators for demanding applications such as multiphoton excitation microscopy, seeding terawatt amplifiers, and carrier envelope phase-stabilized systems. They support the new generation of one-box laser oscillators where wavelength tuning and other output parameters are adjusted in a simple push-button operation rather than by physically exchanging cavity optics with limited bandwidth.