Nikon Inc. has introduced an inspection system for semiconductor and optical storage media manufacturing. Fab operators can observe and analyze lines and spaces with widths down to 0.1 µm with the LU2000-DUV inspection system. Using visible light, the system allows the user to inspect minute patterns. Changing to deep-ultraviolet light produces high signal-to-noise-ratio images that appear monochromatically on the monitor in real time. Magnification up to 10,000x can be achieved. The system is suitable for inspecting masks, reticles, optical discs, magnetoresistive storage media, and the gap and track of magnetoresistive heads.