Leybold Optics has developed the second generation of a unique sputtering system for coating at 13.4 nm – the EUV range. The coating system can feature up to six sputtering targets to coat MO and Si layers. The layer systems consist of more than 100 layers with very tight thickness specifications that require high precision, high stability and excellent reproducibility. The machine also features a load lock. The tool is used for applications in EUV lithography.