Electron Microscope Decontaminator
XEI Scientific Inc.Request Info
XEI Scientific Inc., manufacturer of the Evactron plasma cleaning
system for electron microscopes and other vacuum chambers, has announced that the
product can be used to clean carbon decontamination using hydrogen. According to
the company, atomic hydrogen created by the Evactron plasma is effective in cleaning
carbon contamination from extreme-ultraviolet (EUV) optics. For the semiconductor
industry to continue making smaller features, lithographic systems are moving to
shorter wavelengths such as EUV, and the very elaborate and expensive optics required
may be damaged by oxygen cleaning. Using the plasma cleaning system with hydrogen
gas has produced atomic hydrogen and been successful in removing hydrocarbon contamination
from EUV mirrors. Cleaning rates were seen in the nanometers-per-minute range and
at distances of up to 30 cm from the remote plasma source.
http://www.evactron.com
/Buyers_Guide/XEI_Scientific_Inc/c19362
Published: June 2011
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