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  • Film Thickness Measurement Tool
Jul 2011
CRAIC TechnologiesRequest Info
SAN DIMAS, Calif., July 11, 2011 — For the semiconductor industry, Craic Technologies Inc. has developed the 20/20 XL, a film thickness measurement tool. It is a microspectrophotometer designed to nondestructively spectrally analyze and image microscopic areas of very large samples.

Thin-film thickness can be measured in both transmission and reflectance. The system also measures the Raman spectra of microscopic samples and performs ultraviolet and near-infrared microscopy of semiconductor and other types of samples. Applications include mapping thin-film thickness of large devices, locating and identifying contaminants, and measuring strain in silicon.

The system offers a full microscopy suite and can be operated manually or automatically. There is no upper limit to the sample size, making it suitable for measuring everything from quality control of the largest flat panel displays to film thickness of 300-mm wafers.

The microspectrophotometer offers an advanced film thickness measurement unit, a Raman spectrometer, a UV-VIS-NIR range microscope, high-resolution digital imaging and powerful, easy-to-use software. It is designed to attach to large frames that can accommodate large-scale samples. It acquires data from microscopic features of samples by absorbance, reflectance or luminescence spectroscopy.

With the high-resolution digital imaging, the instrument can be used as an ultraviolet or infrared microscope. The company’s Apollo Raman spectroscopy modules may be added so the user may also acquire small spot Raman spectra. Touch screen controls and calibrated variable apertures enhance microanalysis.


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In optics, an image is the reconstruction of light rays from a source or object when light from that source or object is passed through a system of optics and onto an image forming plane. Light rays passing through an optical system tend to either converge (real image) or diverge (virtual image) to a plane (also called the image plane) in which a visual reproduction of the object is formed. This reconstructed pictorial representation of the object is called an image.
A specialized spectrophotometer for use through a microscope on very small areas of an object.
The ratio of reflected flux to incident flux. Unless otherwise specified, the total reflectance is meant; it is sometimes convenient to divide this into the sum of the specular and the diffuse reflectance.
ultraviolet microscopy
The study and photographing of microscope specimens in ultraviolet light; using an optical microscope containing fluorite and quartz components to efficiently image wavelengths much shorter than the visible spectrum. The short wavelength operation provides high-resolution study resulting in high contrast observation and detection of semiconductor surface imperfections below the diffraction limit of visible light.
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