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Dimension Edge PSS AFM

Photonics.com
Aug 2011
Bruker Nano SurfacesRequest Info
 
SANTA BARBARA, Calif., Aug. 16, 2011 — Bruker Corp. has launched the Dimension Edge PSS atomic force microscope (AFM), a production-environment instrument tailored for patterned sapphire substrate (PSS) metrology in high-brightness LED manufacturing.

The easy-to-operate AFM delivers resolution beyond that produced by traditional optical techniques and provides precise 3-D profile information to control advanced PSS processes. The system performs automated measurement, data collection and analysis, and report generation on 2- to 6-in. wafers for production metrology applications. It also offers capabilities essential for LED research and development. It is supplied with the proprietary AutoMET software package, which improves manufacturing productivity by fully automating AFM data collection and analysis report generation to provide pass/fail output.

The system is a turnkey production metrology instrument for patterned sapphire substrate manufacturers. The software can be configured to measure between one and nine wafers at multiple points per wafer, including automated data analysis and reporting, providing measurement details to the engineer and a pass/fail indicator to the operator.


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