Oct 2011Plasma Etch Inc.Request Info
CARSON CITY, Nev., Oct. 12, 2011 — Plasma Etch has introduced a plasma system that incorporates two individual plasma etching/cleaning-type-mode technologies into one complete stand-alone plasma etching/cleaning system.
The PE-100 Convertible allows the user to switch back and forth between reactive ion etch anisotropic type etching mode applications and isotropic-type etching/cleaning mode applications. Traditionally, two separate stand-alone plasma systems were necessary to achieve this.
The system is suitable for use in research and development, medical devices, solar cells, optics, printed circuit boards, microelectromechanical systems, nanotechnology, life sciences, wafer level packaging and laboratory applications as well as many other related semiconductor processes.