Request InfoPlasma Etch Inc.CARSON CITY, Nev., Oct. 12, 2011 — Plasma Etch has introduced a plasma system that incorporates two individual plasma etching/cleaning-type-mode technologies into one complete stand-alone plasma etching/cleaning system. The PE-100 Convertible allows the user to switch back and forth between reactive ion etch anisotropic type etching mode applications and isotropic-type etching/cleaning mode applications. Traditionally, two separate stand-alone plasma systems were necessary to achieve this. The system is suitable for use in research and development, medical devices, solar cells, optics, printed circuit boards,...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 12/12/2022Optical Sensing InterrogatorsFemto Sensing International has expanded its SX line of optical sensing interrogators for high-sensor-count fiber Bragg grating (FBG) applications. 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