CRAWLEY, England, Oct. 26, 2011 — Edwards Ltd. has expanded its iXH family of harsh process dry pumps with the introduction of the iXH500H series, optimized for flat panel, solar and advanced semiconductor processes requiring high gas flows and flexible pump temperature profiles. The pumps offer significant cost of ownership benefits as a result of lower energy consumption and enhanced mean time between servicing, while delivering the small footprint and hydrogen pumping capabilities of the iXH450 series and reducing pump energy consumption by up to 15%. Vacuum pumps used by flat panel, solar and semiconductor manufacturers must accommodate a wide range of operating conditions and materials. The new models’ temperature flexibility makes them suitable for such harsh processes. Running at low pump temperatures is beneficial for processes that use high flows of corrosive gases, such as flat panel display plasma-enhanced chemical vapor deposition (PECVD), thin-film solar PECVD and semiconductor metallorganic chemical vapor deposition (MOCVD), or for processes that use thermally sensitive precursors, such as atomic layer deposition, that could “plate out” byproducts within the pump. High operating temperatures can be used where the risk is condensation of byproducts within the pump; e.g., high-k dielectric deposition. The pumps are now available, as are service upgrades to convert existing iXH450 series pumps to the new iXH500H series.