OLCHING, Germany, Jan. 9, 2012 — Photolithographic filters are used in applications with LSI and LCD steppers in which high-power mercury vapor lamps are used for illumination. The narrow bandpass filters produce an almost monochromatic radiation, allowing high resolution to be achieved in the target. Laser Components GmbH’s partner Omega Optical has revised its i-line bandpass filters. The filter designs are now available based on dual magnetron reactive sputtering coating, significantly improving both the intensity of the i-line and its homogeneity in the photolithographic process. One new product from Omega is of interest for microelectromechanical systems production. MicroChem Corp., manufacturer of the SU-8 photoresist, recommends that UV radiation below 350 nm be blocked to produce perpendicular structures. The PL-360-LP from the mask aligner series is suited to this application. All filters are available from Laser Components.