Scanning Electron Microscope
Feb 2012Tescan USA Inc.Request Info
Tescan has unveiled the FERA3 XMH, a high-resolution Schottky field emission scanning electron microscope with an integrated plasma source focused ion beam. The system was developed in cooperation with Orsay Physics. Besides electron and ion columns, the microscope can be configured with gas injection systems, nanomanipulators, secondary electron detectors, backscatter detectors, secondary ion detectors, cathodoluminescence detectors, and energy-dispersive and electron backscatter diffraction microanalyzers. The use of a xenon plasma source for the focused ion beam allows the FERA3 to satisfy high-resolution focused ion beam requirements (imaging, fine milling/polishing) as well as to produce the high ion currents needed for ultrafast material removal rates. The resolution of the plasma ion beam is <100 nm, and the maximum xenon ion current is >1 µA.