AUBURN, Mass., May 9, 2012 — For use with a 3-D laser lithography system made by Nanoscribe GmbH, PI (Physik Instrumente) L.P. has released an X-Y-Z nanopositioning stage. The lithography system produces complex 3-D structures, fully automatic and repeatable, with precision and flexibility. Submicron structures with sizes of up to 1 mm and widths to 150 nm are possible. The PImars P-563 flexure-guided, piezo-driven three-axis nanopositioning stage provides positioning ranges to 300 × 300 × 300 μm and nanometer-range repeatability. An integrated parallel-metrology position feedback system based on highly linear capacitive sensors allows the sample to be moved precisely and repeatedly in relation to the laser focus. A digital piezo motion controller provides the necessary path control on a nanometric scale. The high accuracy and fast response of the piezoelectric nanopositioning stage make it possible to equip surfaces with particular biometric characteristics or to create microstructures for small pumps and needles. A typical application for 3-D laser lithography is the creation of three-dimensional structures for cell biology.