PEABODY, Mass., June 3, 2012 — JEOL USA Inc.’s series of field-emission scanning electron microscopes (SEMs) is now complete with the introduction of the JSM-7800F for nanotechnology imaging and analysis. The microscope makes it possible to observe the finest structural morphology of nanomaterials at 1,000,000× magnification with sub-1-nm resolution; perform low-kilovolt imaging and analysis of highly magnetic samples; collect large-area electron backscatter diffraction maps at low magnifications without distortion; and image thin, electron-transparent samples with sub-0.8-nm resolution using an optional retractable scanning transmission electron microscope detector. The instrument combines an in-lens field-emission gun with an aperture angle control lens, optimizing large probe currents (up to 200 nA) for operation at a small probe diameter. The super hybrid lens design and in-column detectors with filtering capabilities allow observation of any specimen, especially at ultralow accelerating voltages down to 10 V. The SEM performs x-ray spectroscopy and cathodoluminescence, combining large beam currents with a small interaction volume and increasing analytical resolution to the sub-100-nm scale. Beam deceleration in gentle-beam mode decreases charging on nonconductive samples and reduces lens aberration effects for extreme high-resolution imaging. Applications include cryo-microscopy and electron-beam lithography. The microscope can be configured for low-vacuum operation and accommodates multiple analytical attachments, an IR camera and a stage navigation camera. It is supplied with a choice of three stage sizes and three specimen exchange airlock sizes, and it can be equipped with tensile, heating and cooling stages for in situ experiments.