Jul 2012Ocean Optics Inc.Request Info
DUNEDIN, Fla., July 20, 2012 — Ocean Optics’ NanoCalc systems use spectroscopic reflectometry to accurately determine optical thin-film thicknesses for consumer, semiconductor, medical and industrial applications. Customer-designed and new application-ready preconfigured NanoCalc models make it easy to select the optimum system for deep-UV to NIR wavelength measurement needs.
The systems are available for a range of wavelength, sampling method and optical layer thickness requirements from 1 nm to 250 µm. Users can select among four standard models from ~200 to 1700 nm and combine them with software, reflection probes, optical fibers and various accessories. For applications in the visible (400 to 850 nm) or the UV-visible (250 to 1050 nm), users can select preconfigured systems comprising the NanoCalc, a reflection probe and a sampling stage, a calibrated Si-SiO2 five-step reference wafer and software that analyzes up to 10 optical layers.
For more demanding applications, systems are available with an extensive range of add-on software, optical fibers and metrology accessories, such as mapping stages and adapters for microscopes, and micro-spot focusing objectives.
The systems are used in transmission and reflection measurements of antireflection and hardness coatings, amorphous silicon on solar panels, OLED displays, determination of photoresist layers for photomasks and testing the optical properties of optical coatings.
Custom systems also are available, offering additional user control for in situ, multipoint and vacuum measurements. Users have flexibility in their choice of fiber assemblies or reflection probes. Also, they can control NanoCalc functions from other software or operate mapping stages with software add-ons including remote, online, mapping and multilayer options.