Sep 2012Energetiq Technology Inc.Request Info
WOBURN, Mass., Sept. 26, 2012 — Energetiq Technology Inc. has announced its EQ-10HP 20-W extreme-ultraviolet (EUV) light source for actinic inspection of EUV masks.
It operates at substantially higher input powers than its EQ-10 series predecessors and delivers 20 W of in-band EUV into 2 pi steradians. Its small, stable, inductively driven plasma makes it suitable for use in EUV metrology and inspection applications, and its modular design facilitates integration into a process tool.
The system includes the proprietary and patented Electrodeless Z-pinch source assembly, vacuum and gas subsystems, a power delivery subsystem and control electronics.