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Process Vacuum Monitor

Photonics.com
Nov 2012
Hiden Analytical Ltd.Request Info
 
WARRINGTON, England, Nov. 13, 2012 — Hiden Analytical Ltd.’s HALO 201 MBE (molecular beam epitaxy) in-process vacuum monitor is designed for thin-film preparation and etching.

Mounting on a standard DN-40-CF Conflat-type flange, the probe’s sensitive ionization region is totally shrouded to inhibit random surface deposition. Construction materials are restricted to stainless steel, molybdenum and alumina to minimize potential process contamination in aggressive environments.

The unit has a mass range of 1 to 200 atomic mass units for measurement of all common gases and contaminants, with operating modes for vacuum species identification, leak detection and process trend analysis. User-assignable input/outputs enable simultaneous operation for identification of process irregularities and for vacuum protection.

MASsoft Professional PC control software is intuitive and multilevel, offering simple operation. Features include template-driven quick-start operation, multiple residual gas analysis operation over Ethernet link, mixed-mode scanning, trend analysis extraction from multiple sequential mass range scans and auto mass alignment. The PC interface includes TCP/IP, USB and RS-232 communication links, multiprotocol RS-485 links for external devices such as temperature and process pressure, and five-channel transistor-transistor logic for process control auto start/stop triggering.


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