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Centering Microscopes

Photonics.com
Dec 2012
Titan Tool Supply Inc.Request Info
 
BUFFALO, N.Y., Dec. 19, 2012 — Centering microscopes for use on three-coordinate measuring machines, vertical milling machines, jig borers, jig grinders, electrical discharge machines, and lathes, centered to the center of rotation of the spindle, have been launched by Titan Tool Supply Co. Inc.

The reticle is located in the microscope, which is offered in magnifications from 10× to 200×. These magnifications can be improved and increased with video enhancement beyond 400×, depending upon the size of the monitor and camera used. The centering scope can turn any machine with accurate readout capabilities into an inspection center.

Because the microscopes display an upright image, optically correct from left to right, the operator sees the workpiece through the microscope the same as without it, eliminating mistakes resulting from confusion in transposing or converting the optical image.

Seven models are available: Model X-I, with magnification of 20× and 40×; Model X-II, with 50× and 100×; Model Y-I, with 20× and 40×; Model Y-II, with 50× and 100×; Model Y-III, with 100× and 200×; Model Y-IV, with 200× and 400×; and Model Z-I, with 10× and 20×.

The design features hardened and ground ½-in.-diameter shanks, which makes them easily adaptable to all machines through the use of adjustable collets.

Options include eyepieces to increase magnification; reticles in metric and inch versions; and fiber optic ring illuminators and video adapters that increase the magnification range, improve resolution, relieve eyestrain, allow for viewing on large machines and allow the image to be frozen, digitized and computerized.

Applications include surface finish inspection; drilling of printed circuit boards through prior location and centering; the picking up of details too small or inaccessible to an indicator or edge finder; and three-coordinate measuring and inspection of dies, molds, castings and precision parts.


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GLOSSARY
reticle
An optical element located at an image plane, containing a pattern that assists in pointing an instrument or measuring target characteristics. It may be as simple as a pair of crossed lines or a complex pattern. In semiconductor pattern generation, a glass or quartz substrate bearing the image of an integrated circuit.  
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