Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
SPECIAL ANNOUNCEMENT
2016 Photonics Buyers' Guide Clearance! – Use Coupon Code FC16 to save 60%!
share
Email Facebook Twitter Google+ LinkedIn

GT64A ArF Excimer Laser

Photonics.com
Apr 2013
Gigaphoton Inc.Request Info
 
OYAMA, Japan, April 4, 2013 — Lithography light source manufacturer Gigaphoton Inc. has enhanced its ArF platform with the GT64A, an excimer laser that achieves power levels of up to 120 W for multipatterning in 450-mm wafer production.

The system offers the same twin-chamber architecture, output control algorithm and beam alignment technologies as its predecessors but provides greater output power, beam performance and stability. Power output can be automatically adjusted to optimal levels of light energy based on the customer’s process.

The instrument provides longer pulse durations and highly stable energy, spectral bandwidth and beam profile. It also offers improved overlay accuracy, dimension control and minimization of line-edge roughness.


REQUEST INFO ABOUT THIS PRODUCT

* Message:
(requirements, questions for supplier)
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
Address:
Address 2:
City:
State/Province:
Postal Code:
* Country:
Phone #:
Fax #:

Register or login to auto-populate this form:
Login Register
* Required
Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2016 Photonics Media
x We deliver – right to your inbox. Subscribe FREE to our newsletters.