OYAMA, Japan, April 4, 2013 — Lithography light source manufacturer Gigaphoton Inc. has enhanced its ArF platform with the GT64A, an excimer laser that achieves power levels of up to 120 W for multipatterning in 450-mm wafer production. The system offers the same twin-chamber architecture, output control algorithm and beam alignment technologies as its predecessors but provides greater output power, beam performance and stability. Power output can be automatically adjusted to optimal levels of light energy based on the customer’s process. The instrument provides longer pulse durations and highly stable energy, spectral bandwidth and beam profile. It also offers improved overlay accuracy, dimension control and minimization of line-edge roughness.