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Thin-Film Metrology System

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Rudolph Technologies Inc.
Rudolph Technologies Inc. has released the S3000SX thin-film metrology system for transparent films in semiconductor fabrication applications at the 28-nm node and below. The 405-nm system, which can be tailored to specific process requirements, uses proprietary focused-beam ellipsometry (FBE) and small-site measurement optics to measure the thickness of single-layer and multilayer films on product wafers as small as 30 × 30 µm. The instrument is compatible with silicon on insulators, thin films and SiGe. The FBE uses three laser sources operating at different wavelengths to...See full product

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