Request InfoRudolph Technologies Inc.Rudolph Technologies Inc. has released the S3000SX thin-film metrology system for transparent films in semiconductor fabrication applications at the 28-nm node and below. The 405-nm system, which can be tailored to specific process requirements, uses proprietary focused-beam ellipsometry (FBE) and small-site measurement optics to measure the thickness of single-layer and multilayer films on product wafers as small as 30 × 30 µm. The instrument is compatible with silicon on insulators, thin films and SiGe. The FBE uses three laser sources operating at different wavelengths to...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 6/13/2023Linear Voice Coil MotorThe HVCM-051-032-013-01 Linear Voice Coil Motor from Moticont features a high force-to-size ratio and a 19.1-mm stroke. 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