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ALD System

Photonics.com
Jan 2015
Ultratech/CNTRequest Info
 
SAN JOSE, Calif., Jan. 7, 2015 — Ultratech Cambridge NanoTech has announced a new atomic layer deposition (ALD) system for creating and characterizing thin films.

The Savannah G2 features a low-vapor precursory delivery system for growth of novel materials including single- and multicomponent perovskite, yttrium, lithium and rare-earth films.


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GLOSSARY
thin film
A thin layer of a substance deposited on an insulating base in a vacuum by a microelectronic process. Thin films are most commonly used for antireflection, achromatic beamsplitters, color filters, narrow passband filters, semitransparent mirrors, heat control filters, high reflectivity mirrors, polarizers and reflection filters.
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