Feb 2015Gigaphoton Inc.Request Info
OYAMA, Japan, Feb. 17, 2015 — Gigaphoton Inc.’s newest ArF excimer lithography laser is equipped with environment- and cost-friendly gas- and electricity-reduction technologies.
The GT64A4’s open platform is capable of supporting many kinds of collaborative development efforts. It allows laser data to be easily shared and utilized by customers and partners in cooperation with Gigaphoton to develop new technologies for reducing operational costs and environmental impact.
It also features new spectrum control technology capable of achieving high spectral beam stabilization to within ±5 femtometers, enhancing critical dimension (CD) stability across wafers.