EGGENSTEIN-LEOPOLDSHAFEN, Germany, Feb. 27, 2015 — A new extension set from Nanoscribe bridges the gap between 3-D laser lithography and 3-D printing for microfabrication applications. Supplementing the company’s Photonic Professional GT 3-D printer, the extension set includes precision optics and a newly developed photoresist, IP-S. It permits fast, precise exposure of liquid printing material combined with maximum mechanical strength, accuracy and surface smoothness on all kinds of substrates. Nanoscribe overhauled its NanoWrite and DeScribe software and implemented intelligent writing strategies to increase speed. This nonlinear lithography technology uses two-photon polymerization to create structural details in the submicron range.