Jul 2016HORIBA ScientificRequest Info
EDISON, N.J., July 8, 2016 — Horiba Scientific has announced a differential interferometry profiling (DIP) system for depth profiling in glow discharge optical emission spectrometry (GD-OES).
GD-OES is a technique for fast, multi-elemental depth profiling of conductive and nonconductive materials. GD-OES relies on plasma for the sputtering of a representative area of the investigated specimen and on a high resolution spectrometer for the simultaneous measurement of all elements of interest.
DIP provides real-time layer thickness, crater depth and sputter rate without calibration. The new instrument capability offers in situ direct measurement. The feature can also be retrofitted on existing GD-OES instruments.