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EUV Exposure Tool

Photonics.com
Jul 2016
ASML NVRequest Info
 
VELDHOVEN, Netherlands, July 21, 2016 — ASML has announced the TWINSCAN NXE:3350B extreme UV (EUV) Exposure Tool.

More than 1200 wafers per day (wpd) are exposed on the NXE:3350B at a customer site, with peak performance of 1488 wpd. Five customer systems have achieved a four-week average availability of more than 80 percent.

The device prepares customers for manufacturing insertion.


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GLOSSARY
wafer
A cross-sectional slice cut from an ingot of either single-crystal, fused, polycrystalline or amorphous material that has refined surfaces either lapped or polished. Wafers are used either as substrates for electronic device manufacturing or as optics. Typically, they are made of silicon, quartz, gallium arsenide or indium phosphide.
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