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Photomask Tuning System

Photonics.com
Sep 2016
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JENA, Germany, Sept. 12, 2016 — Carl Zeiss AG has announced the ForTune photomask tuning system.

Combining capabilities from the company’s CDC and RegC devices in a new advanced system, the mask registration and critical dimension uniformity can be completed in one process. The system also helps expand the lithography process window, reduce the wafer intrafield hot spots, improve wafer intra-field on-product overlay and enhance mask image placement.

The ForTune provides high process efficiency and prediction accuracy, as well as an improved output.


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