Request InfoKurt J. Lesker Co.Kurt J. Lesker Co. has developed a generation of Torus UHV sputtering sources that are compatible with vacuum systems designed to reach base pressures below 10-10 t. They have no O-rings, and the magnet assembly is removable without breaking the vacuum, allowing for 350 °C chamber bake-out. The magnet arrays can be adjusted in situ so the user can sputter both magnetic and nonmagnetic materials. The sources are suitable for magnetic storage devices, superconducting materials, semiconductor fabrication and other applications that require ultrapure thin films.See full productRelated content from Photonics MediaWEBINARSPhotonics.com 7/22/2021STANDARDS UPDATE: Vision Standards: An Overview of Global and A3 DevelopmentsStandards play a key role in the vision and imaging industry by ensuring interoperability of components, increasing market size, and shortening the time it takes to get new products to market. As the...Photonics.com 7/20/2023Motorized and Calibrated Lenses for Machine Vision ApplicationsMany applications have benefited from motorized varifocal lenses that allow automatic or remote adjustment of focus distance and field of view. Applications may need to change the focal length or...Photonics.com 1/9/2023Innovations in Ultrashort-Pulse and RF-Excited CO2 Lasers Expand Materials Processing ApplicationsIndustrial laser materials processing is constantly evolving. Industries as varied as pharmaceutical, consumer electronics, automotive, aerospace, and textiles, among others, have benefited from new...Photonics.com 1/18/2018Fiberguide RARe Motheye Fiber: Random Anti-Reflective (RARe) Nanostructures on Optical Fibers as Replacement for AR CoatingsAnti-reflective (AR) coatings are now entering their second century and have remained virtually unchanged throughout their life. As power level and wavelength range requirements continue to increase,...