Accent on Applications | May 2004
An interferometer that promises to improve the characterization of phase-shift masks for use in semiconductor lithography has been developed by...
Using a novel Fourier transform spectrometer optimized for ultraviolet wavelengths, Gillian Nave and Craig J. Sansonetti of the National Institute of...
One machine eye equals four human ones. That's the formula used by manufacturers when following US Food and Drug Administration (FDA) guidelines for...