Rohm and Haas Electronic Materials, a Marlborough, Mass., supplier of lithography materials for the semiconductor industry, and Dow Corning Corp. of Midland, Mich., have renewed their joint agreement to develop spin-on silicon hard-mask antireflection coatings products for sub-65-nm node flash, dynamic random access memory and logic integrated circuit devices. The companies’ initial collaboration began two years ago, producing spin-on hardmask material that is being used in high-volume flash memory production.

Dow Corning will supply the resins that provide high silicon content when incorporated into Rohm and Haas coatings.

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