Ultraviolet and vacuum UV detection and imaging sensors are required for scientific instrumentation — UV spectrometers and camera systems — used to evaluate the uniformity of beams in vacuum UV lithography equipment. Conventional CCD and CMOS devices are predominantly red-sensitive, peaking at ∼800 nm.

General UVA, UVB and UVC applications require detectors that have responses in the 200 to 400 nm region of the spectrum. For semiconductor lithography applications, the wavelengths of interest are 193 and 157 nm and, in the future, wavelengths down to 13.5 nm will be needed for extreme-UV lithography (Figure 1)...