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Business World | August 2007
Carl Zeiss to Supply Tools for Photomask Metrology

A team of manufacturers led by Sematech of Austin, Texas, has selected Carl Zeiss SMT AG of Oberkochen, Germany, to supply advanced tools for photomask pattern placement metrology. The technology is considered critical in the implementation of 193-nm immersion lithography and of extreme-UV lithography for the 45-nm mode and beyond.

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