JEOL USA Inc. has announced the MultiBeam SEM/FIB for focused ion beam micromilling and high-resolution scanning electron microscopy imaging in one unit. The system features the company’s S³ serial slicing and sampling technology, which enables in-process monitoring of milling, fabrication and three-dimensional image reconstruction of the sectioned area. Specifications include a 30-nA maximum milling current for high throughput, low vacuum operation, a gas-injection system, a sample stage that can accommodate wafers as large as 150 mm, an airlock sample-loading system and a multiple-port design.

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