Edwards has introduced the iXH series harsh process vacuum pumps for use in the semiconductor industry. The pumps are designed to accommodate new manufacturing processes such as atomic layer deposition as well as compound semiconductor processes. They offer enhanced purge flow, a temperature-controlled operating range, light gas performance, corrosive gas resistance, and better thermal control and torque than previous generations provided. The Gas Buster inlet purge manages process by-products, and the active utility control includes an idle mode for times when the pump is not in use.

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