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  • magnetron sputtering

A variation from standard physical vapor deposition (PVD) coating techniques, magnetron sputtering is a plasma coating process that utilizes magnetic fields to contain the plasma in front of the target in order to intensify the bombardment of ions on the target during the sputtering process. The result of magnetron sputtering is a dense plasma coating deposited on a given substrate that is placed in front of the target.
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