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Photonics Dictionary

  • modified chemical vapor deposition (MCVD)

A vapor deposition method for the manufacture of high performance optical fibers and lightguides. In MCVD select chemicals (typically germanium or phosphorous silicate) are fused and deposited layer by layer onto a glass tube/substrate after the chemicals are subject to fire. The chemicals are mixed inside a glass tube that rotates on a lathe. The flame is controlled by a traveling burner that moves along the tube causing the chemical reaction to take place and fuse the deposited material on the inside of the tube. Post depositions, the tube is collapsed into a pure form of silica that is then drawn, checked, coated and stored for fiber fabrication. See chemical vapor deposition.
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