Gigaphoton reports 2-h-straight run for EUV source

Gigaphoton Inc.’s extreme UV (EUV) laser-produced plasma (LPP) light source has achieved 2-h continuous operation. The milestone was confirmed using a prototype LPP system that generates EUV light by irradiating tin droplets with a solid-state prepulse laser and a CO₂ main-pulse laser. “We will continue our efforts to help to bring the industry closer to realizing EUV lithography tools for high-volume manufacturing,” said President and CEO Hitoshi Tomaru.

Based in Oyama, Japan, the lithography light source manufacturer also announced it has delivered its first ArF immersion excimer laser to a major lithography scanner manufacturer. The GT64A laser produces variable power outputs ranging from 90 to 120 W for multipatterning in 450-mm wafer production applications.