Oxford Instruments Plasma Technology Receives CS Industry Award

Oxford Instruments Plasma Technology Ltd. has received Compound Semiconductor magazine’s CS Industry Award for High Volume Manufacturing.

The award celebrates the company’s development of silicon carbide (SiC) plasma etch processes delivered through the PlasmaPro100 Polaris systems.

“We are very excited to receive this award, as it recognizes some of the great innovation that is carried out by the people here at Plasma Technology," said Frazer Anderson, strategic marketing and business development director at Oxford Instruments Plasma Technology. The SiC via etch process developed is an important step in producing next-generation radio frequency devices, it gives excellent device performance with the smooth etch sidewalls and low cost of ownership,”

The awards, now in their fifth year, recognize success and development along the entire value chain of the compound semiconductor industry, from research to completed devices, with a focus on people, processes and products.