Daily News Briefs
ASML, a Netherlands-based provider of advanced technology systems for the semiconductor industry, said it has received the industry's first order for an extreme ultraviolet (EUV) lithography beta tool from
Intel Corp. The EUV beta tool will use 300 mm wafers and is initially targeted for 45-nm-resolution capability. Delivery is slated for the second half of 2005.
. . . Richard S. Danforth has joined
DRS Technologies Inc. as executive vice president, operations, of its Electronic Systems Group.
LATEST NEWS
- Exail Signs LLNL Contract, Partners with Eelume
Apr 26, 2024
- Menlo Moves U.S. HQ: Week in Brief: 4/26/2024
Apr 26, 2024
- Optofluidics Platform Keys Label-, Amplification-Free Rapid Diagnostic Tool
Apr 25, 2024
- DUV Lasers Made with Nonlinear Crystals Enhance Lithography Performance
Apr 25, 2024
- Teledyne e2v, Airy3D Collaborate on 3D Vision Solutions
Apr 24, 2024
- One-Step Hologram Generation Speeds 3D Display Creation
Apr 24, 2024
- Innovation Award Winners for Laser Technology Honored in Aachen
Apr 23, 2024
- Intech 2024: AI Arrives on the Shop Floor
Apr 22, 2024