Laser Could Extend Optical Lithography into VUV

Lambda Physik of Göttingen, Germany, has developed a high-power, vacuum UV light source that may enable optical lithography to reach beyond the limits of the 193-nm ArF lasers now in use.





LATEST NEWS

• AmeriCOM Adds President and CEO: People in the News: 5/1/24
  May 1, 2024
• Machine Learning Pushes High-Power Lasing Limits
  May 1, 2024
• IPG Names Industry Veteran Mark Gitin CEO
  Apr 30, 2024
• 16th Biannual Optatec Conference Continues in Frankfurt
  Apr 30, 2024
• Celestial Surface Mapping Tech Combines Established Techniques
  Apr 30, 2024
• TSMC Partnerships Target Integrated Photonics Capabilities
  Apr 30, 2024
• CLEO Heads to the East Coast
  Apr 29, 2024
• Qubits Could be Stored in Flash-Like Memory
  Apr 29, 2024