Photronics Sponsors Seminar on Nanoimprint Lithography

BROOKFIELD, Conn., Sept. 9 -- Photronics Inc., a manufacturer of photomasks, announced that it will host a two-hour technology seminar on nanoimprint lithography during the Micro- and Nano- Engineering Conference in Vienna, Austria, on Sept. 21.

During the seminar, researchers from ST Microelectronics, Laboratoire des Technologies de la Microelectronique/CNRS, Leica and Photronics will present their outlooks on nanoimprint lithography applications, process development, metrology, electron beam lithography for template fabrication, template infrastructure development and reticle enhancement technology options for process nodes at and beyond 45 nm.

For more information on the seminar, visit: www.photronics.com