Cymer Adds 2 Science Advisers for EUV R&D

Christopher Progler, PhD, and Patrick P. Naulleau, PhD, have joined the scientific advisory board of Cymer Inc., a San Diego supplier of light sources used in semiconductor lithography. Progler is chief technology officer and executive vice president of Photronics Inc., a maker of reticles and photomasks for semiconductor and microelectronic applications, is a SPIE fellow and board member and chairs the SPIE Advanced Lithography Symposium. He also represents Photronics on the board of managers for MP Mask Technology Center LLC, the company's joint venture with Micron Technology Inc. that produces photomasks for semiconductor manufacturing at a Photronics facility in Boise, Idaho. Progler is a guest lecturer at the University of Texas at Dallas School of Engineering and is on its industrial advisory board. He has published numerous papers and patents on lithography, is an associate editor for the Journal of Microlithography, Microfabrication and Microsystems,and is frequently a speaker at industry events. Naulleau is lead scientist at Lawrence Berkeley Lab’s Center for X-Ray Optics, in Berkeley, Calif., overseeing R&D and projects in nanolithography and nano-optic systems and components. He is also a visiting professor, electrical engineering and computer sciences, at the University of California, Berkeley, where he teaches a Fourier optics course and supervises graduate research. He was formerly an associate professor and senior research scientist at the University of Albany, State University of New York, where he led EUV activities and other research in nanolithography and nanometrology systems. He is the author of numerous papers and a conference presenter who holds more than 30 patents and invention disclosures.