EUV LITHOGRAPHY
The 700-page volume
EUV Lithography provides comprehensive information on extreme-ultraviolet (EUV) lithography for practitioners and for those needing an introduction to the field. Written by experts in the technology, the resource addresses EUV optics, source technology, wavefront measurement techniques for optical testing, mask and mask metrology, resist technology and system patterning performance. The topic of contamination and its control in EUV lithography scanners also is discussed. Vivek Bakshi, ed.; !%SPIE Press%!, Bellingham, Wash.; John Wiley & Sons Inc., Hoboken, N.J., 2009; $89 SPIE members; $105 nonmembers.
LATEST NEWS
- CLEO Heads to the East Coast
Apr 29, 2024
- Laser-Based Gas Analyzer Developed to Detect Air Pollution
Apr 29, 2024
- Qubits Could be Stored in Flash-Like Memory
Apr 29, 2024
- Exail Signs LLNL Contract, Partners with Eelume
Apr 26, 2024
- Menlo Moves U.S. HQ: Week in Brief: 4/26/2024
Apr 26, 2024
- Optofluidics Platform Keys Label-, Amplification-Free Rapid Diagnostic Tool
Apr 25, 2024
- DUV Lasers Made with Nonlinear Crystals Enhance Lithography Performance
Apr 25, 2024
- Teledyne e2v, Airy3D Collaborate on 3D Vision Solutions
Apr 24, 2024