Vistec, MIET to Collaborate
Vistec Electron Beam GmbH of Jena, Germany, has announced its entrance into a joint electron beam lithography project with Moscow Institute of Electronic Technology (MIET). The two will collaborate on a photomask manufacturing project that began recently in Russia. The electron beam lithography provider will supply the institute with a 50-kV variable-shaped beam system, which is equipped with fully automated substrate handling and can expose different substrate types and sizes. MIET will provide the masks to the semiconductor industry and research institutes in Russia for a variety of applications.
LATEST NEWS
- Exail Signs LLNL Contract, Partners with Eelume
Apr 26, 2024
- Menlo Moves U.S. HQ: Week in Brief: 4/26/2024
Apr 26, 2024
- Optofluidics Platform Keys Label-, Amplification-Free Rapid Diagnostic Tool
Apr 25, 2024
- DUV Lasers Made with Nonlinear Crystals Enhance Lithography Performance
Apr 25, 2024
- Teledyne e2v, Airy3D Collaborate on 3D Vision Solutions
Apr 24, 2024
- One-Step Hologram Generation Speeds 3D Display Creation
Apr 24, 2024
- Innovation Award Winners for Laser Technology Honored in Aachen
Apr 23, 2024
- Intech 2024: AI Arrives on the Shop Floor
Apr 22, 2024