Lithography System Selected

Yale University of New Haven, Conn. has selected Vistec Lithography Inc.’s EBPG5000plus electron-beam lithography system for its future nanotechnology research programs. As part of the Yale Institute for Nanoscience and Quantum Engineering, it will encourage multidisciplinary research involving the university’s faculty, students and worldwide research partners. The company, of Watervliet, N.Y., is a provider of electron-beam lithography equipment based on shaped beam technology.