Partnership Eyes Deep-UV Photolithography
Cymer Inc. and
Carl Zeiss Lithos have teamed up to facilitate the development of optical components and modules for lithography light sources. San Diego-based Cymer supplies illumination sources for deep-UV photolithography, and Carl Zeiss Lithos of Germany manufactures optics.
Engineers from both companies will investigate how optics and light sources interact. They also will try to achieve finer resolutions and smaller linewidths to enable further advances in semiconductors in compliance with the
Semiconductor Industry Association road map. Zeiss will contribute optics and coatings, while Cymer will continues its development of excimer laser illumination sources.
LATEST NEWS
- Exail Signs LLNL Contract, Partners with Eelume
Apr 26, 2024
- Menlo Moves U.S. HQ: Week in Brief: 4/26/2024
Apr 26, 2024
- Optofluidics Platform Keys Label-, Amplification-Free Rapid Diagnostic Tool
Apr 25, 2024
- DUV Lasers Made with Nonlinear Crystals Enhance Lithography Performance
Apr 25, 2024
- Teledyne e2v, Airy3D Collaborate on 3D Vision Solutions
Apr 24, 2024
- One-Step Hologram Generation Speeds 3D Display Creation
Apr 24, 2024
- Innovation Award Winners for Laser Technology Honored in Aachen
Apr 23, 2024
- Intech 2024: AI Arrives on the Shop Floor
Apr 22, 2024