Storex Tech Study Clears Optical Lithography Hurdle
Storex Technologies Inc. has developed an optical lithography technique with a resolution of 1 nm half-pitch lines, clearing a major hurdle in this field.
Many attempts have been made to break the diffraction limit, which Storex researchers said has long been a problem in optical lithography. In its study, the company demonstrated that quantum optical lithography can attain 1-nm resolution by optical means using new materials, including fluorescent photosensitive glass ceramics and QMC-5, a proprietary photoresist material.
As part of the study, nanostructures were analyzed by transmission electron microscopy (TEM) and scanning electron microscope (SEM), and a dependence between laser power and line width was established. Written patterns on the QMC-5 were then transferred onto a silicon wafer using an etching process.
The performance is several times better than that described for any other optical or electron beam lithography methods, said Storex CEO Eugen Pavel.
Previous attempts in similar studies had only demonstrated direct beam writing of 2-nm-width lines.
The work was published in
Optics & Laser Technology. (
doi: 10.1016/j.optlastec.2014.01.016)
For more information, visit:
www.storextechnologies.com
LATEST NEWS
- Exail Signs LLNL Contract, Partners with Eelume
Apr 26, 2024
- Menlo Moves U.S. HQ: Week in Brief: 4/26/2024
Apr 26, 2024
- Optofluidics Platform Keys Label-, Amplification-Free Rapid Diagnostic Tool
Apr 25, 2024
- DUV Lasers Made with Nonlinear Crystals Enhance Lithography Performance
Apr 25, 2024
- Teledyne e2v, Airy3D Collaborate on 3D Vision Solutions
Apr 24, 2024
- One-Step Hologram Generation Speeds 3D Display Creation
Apr 24, 2024
- Innovation Award Winners for Laser Technology Honored in Aachen
Apr 23, 2024
- Intech 2024: AI Arrives on the Shop Floor
Apr 22, 2024