Gelest Announced Diiodosilane Commercialization
Semiconductor material Gelest Inc. has announced the commercializing of diiodosilane to meet the global demand of the semiconductor industry for next-generation semiconductor chips.
Gelest’s dedicated diiodosilane plant in Morrisville is fully operational and can produce commercial quantities of diiodosilane with purity in excess of 99.9 percent. Diiodosilane is a key chemical precursor used by semiconductor companies worldwide in the development and scale-up of next-generation semiconductor chips that require high-throughput, highly conformal silicon nitride thin films.
Diiodosilane is typically deposited by plasma-enhanced atomic layer deposition to create the silicon nitride thin film. Gelest sees a significant increase in demand for high purity diiodosilane driven by development and production of semiconductor chips requiring silicon nitride thin films at low thermal budgets.
Gelest is a manufacturer of specialty materials for the semiconductor industry.
LATEST NEWS
- Exail Signs LLNL Contract, Partners with Eelume
Apr 26, 2024
- Menlo Moves U.S. HQ: Week in Brief: 4/26/2024
Apr 26, 2024
- Optofluidics Platform Keys Label-, Amplification-Free Rapid Diagnostic Tool
Apr 25, 2024
- DUV Lasers Made with Nonlinear Crystals Enhance Lithography Performance
Apr 25, 2024
- Teledyne e2v, Airy3D Collaborate on 3D Vision Solutions
Apr 24, 2024
- One-Step Hologram Generation Speeds 3D Display Creation
Apr 24, 2024
- Innovation Award Winners for Laser Technology Honored in Aachen
Apr 23, 2024
- Intech 2024: AI Arrives on the Shop Floor
Apr 22, 2024