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Corning Glass Performs Well in Study

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A durability study performed by International Sematech Inc. of Austin, Texas, has found that Corning HPFS glass performs well under exposure to 193-nm light, said Corning Inc. of Corning, N.Y. The study examined the performance of fused silica samples from five manufacturers in a scaling law test, designed to simulate the effects of argon-fluoride laser radiation on exposure lenses for 193-nm semiconductor lithography. Corning's glass displayed no trend in wavefront distortion after 14 billion pulses, showing densification of less than 10 nm. Exposure at fluence levels of between 0.0063...Read full article

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    Published: August 2001
    industrialResearch & TechnologyTech Pulse

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